Optical Measurement Forum for Micro-Nano Structure
Time：March 12, 2025
Venue：Forum Area at Hall E7, Shanghai New International Expo Centre (SNIEC)
Fee：Free
language：Chinese
Organizers：
Committee for Optical Test and Measurement of Chinese Optics Society (COS-COTM)
Messe München
Co-Organizers：
Tsinghua University
Nanjing University of Science and Technology
Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences
Huazhong University of Science and Technology
MIIT Key Laboratory of Advanced Solid Laser
Messe Muenchen Shanghai Co., Ltd.
Chairmans：
Prof. Hua Shen, Nanjing University of Science and Technology
Co-Chairmans：
Prof. Yidong Tan, Tsinghua University
Prof. Bing Han, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences
Prof. Xiuguo Chen, Huazhong University of Science and Technology
Topics：
Optical Precision Measurement for Micro-Nano Structures
Agenda：
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March 12, 2025 Room M34 at Hall E6, 1st floor, Shanghai New International Expo Centre (SNIEC) |
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Time |
Topics |
Speaker |
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09:00-10:00 |
Registration |
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10:00-10:20 |
Application of FIS4 Four-Wave Shearing Interferometric Sensing Technology in Micro-Nano Optical Inspection |
Yongying Yang, Zhejiang University, Professor |
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10:20-10:40 |
AI and micro/nano measurement |
Shuming Yang, Xi'an Jiaotong University, Professor |
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10:40-11:00 |
The realization and application of the meter definition based on silicon lattice constant. |
Jinjie Wu, National Institute of Metrology, China, Researcher |
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11:00-11:20 |
Advanced Optoelectronic Precision Measurement Technology and Equipment |
Xun Xue, Xi'an Institute of Optics and Precision Mechanics, Chinese Academy of Sciences, Researcher |
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11:20-11:40 |
3D Shape Measurement Method of Diffused/Specular Composite Surface by Phase Information-based Fringe Analysis |
Zonghua Zhang, Hebei University of Technology, Professor |
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11:40-12:00 |
The application of photoelectric measurement technology in semiconductor industry |
Chengwei Dai，jitrioe，Head of precision measurement department |
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12:00-14:00 |
Lunch Time |
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14:00-14:20 |
Introduction of IC Defect Inspect Technology |
Weihu Zhou, Institute of Microelectronics of the Chinese Academy of Sciences, Researcher |
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14:20-14:40 |
Technology discussion on diffraction optical design in optometry |
Changxi Xue, Changchun University of Science and Technology, Professor |
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14:40-15:00 |
Diffraction based IC overlay metrology: instrumentation and method |
Hao Jiang, Huazhong University of Science and Technology, Professor
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15:00-15:20 |
Spectroscopic Characterization on Atomic-Scale Fabrication of Wide-Bandgap Semiconductors |
Zongwei Xu, Tianjin University, Professor |
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15:20-15:40 |
Optical Metrology: from Spheric & Aspheric to Complex Optical Surfaces |
Xinxue Ma, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Associate Researcher |
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15:40-16:00 |
A study on micro-displacement detection technology based on moiré imaging |
Su Shen, Soochow University, Professor |
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16:00-16:20 |
SCHOTT High Homogeneity Optical Glass Empowering Precision Optical Metrology Instruments |
Henning Kaufmann，SCHOTT AG，Product Manager Optical Glass |
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16:20-16:40 |
The Impact of Precision Optical Materials and Processing Techniques on the Performance of Detection Systems |
Yunlong Liu，BTMT Enterprise Organization Chart，Manager of Ultra-Precision Division and Assembly Division |
For most updated information, please refer to the conference schedule posted.